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US Patent Issued to UNITED MICROELECTRONICS on May 12 for "High electron mobility transistor and method for fabricating the same" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,364, issued on May 12, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu City, Taiwan). "High electron mobility transistor and method ... Read More


US Patent Issued to TAIWAN SEMICONDUCTOR MANUFACTURING on May 12 for "Semiconductor device structure and methods of forming the same" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,365, issued on May 12, was assigned to TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (Hsinchu, Taiwan). "Semiconductor device structure an... Read More


US Patent Issued to UNITED MICROELECTRONICS on May 12 for "Semiconductor device and method for fabricating the same" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,366, issued on May 12, was assigned to UNITED MICROELECTRONICS CORP. (Hsin-Chu City, Taiwan). "Semiconductor device and method for fabricati... Read More


US Patent Issued to International Business Machines on May 12 for "Vertical transistors having improved control of parasitic capacitance and gate-to-contact short circuits" (American, Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,367, issued on May 12, was assigned to International Business Machines Corp. (Armonk, N.Y.). "Vertical transistors having improved control o... Read More


US Patent Issued to Mitsubishi Electric on May 12 for "Semiconductor device and method of manufacturing semiconductor device" (Japanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,368, issued on May 12, was assigned to Mitsubishi Electric Corp. (Tokyo). "Semiconductor device and method of manufacturing semiconductor de... Read More


US Patent Issued to INNOSCIENCE (SUZHOU) TECHNOLOGY on May 12 for "Nitride-based semiconductor device with gate protection layer and method for manufacturing the same" (Chinese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,369, issued on May 12, was assigned to INNOSCIENCE (SUZHOU) TECHNOLOGY Co. LTD. (Suzhou City, China). "Nitride-based semiconductor device wi... Read More


US Patent Issued to SUMITOMO ELECTRIC INDUSTRIES on May 12 for "Semiconductor device with multilayer source and drain regions formed in openings of electron supply and transit layers" (Japanese Inventor)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,370, issued on May 12, was assigned to SUMITOMO ELECTRIC INDUSTRIES LTD. (Osaka, Japan). "Semiconductor device with multilayer source and dr... Read More


US Patent Issued to SAMSUNG ELECTRONICS on May 12 for "Semiconductor device and method of manufacturing the semiconductor device" (South Korean Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,371, issued on May 12, was assigned to SAMSUNG ELECTRONICS Co. LTD. (Suwon-si, South Korea). "Semiconductor device and method of manufacturi... Read More


US Patent Issued to Taiwan Semiconductor Manufacturing on May 12 for "Capacitance reduction for backside power rail device" (Taiwanese Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,372, issued on May 12, was assigned to Taiwan Semiconductor Manufacturing Co. Ltd. (Hsinchu, Taiwan). "Capacitance reduction for backside po... Read More


US Patent Issued to Infineon Technologies on May 12 for "Semiconductor device having a field termination structure and a charge balance structure, and method of producing the semiconductor device" (German Inventors)

ALEXANDRIA, Va., May 12 -- United States Patent no. 12,628,373, issued on May 12, was assigned to Infineon Technologies AG (Neubiberg, Germany). "Semiconductor device having a field termination struc... Read More